主持项目

1.国家自然科学基金青年基金项目（51205387），新型LED蓝宝石衬底抛光液设计及其抛光机理研究（2013/01–2015/12），经费24万

2.上海市科技型中小企业创新基金（1803H1D7400），新型蓝宝石抛光液的设计制备及产业化（2017/01–2018/02），经费20万

3.山西省青年拔尖人才项目（2019/12-2021/12），经费60万

参与项目

1.国家十一五集成电路重大专项（2009ZX02030－001），电子级纳米磨料产业化研究及其在IC抛光液中的应用（2009/01-2010/12），经费3983.24万

2.国家十二五集成电路重大专项（2011ZX02704-002），45-28nm集成电路用纳米磨料和相变材料抛光液的研究与产业化（2011/01-2012/12），经费2094万

3.上海市纳米专项（11nm0500300），面向LED蓝宝石衬底的抛光液与抛光工艺示范线（2011/12-2014/09），经费250万

1.张泽芳，张文娟，张善端，李富友. (2019). 氧化铝抛光液对铝合金化学机械抛光性能的研究（英文）. 摩擦学学报，39(01): 109-117.

2.张泽芳，袁薇，徐明，易韬，张善端，李富友. (2018). 二氧化硅-共聚物杂化荧光纳米材料用于动物活体成像的研究。无机化学学报，34（11）：1943-194.

3.Zhang, Z., Zhang, W., Zhang, S., Yan, W. (2017). Study on chemical mechanical polishing performances of sapphire wafer (0001) using silica-based slurry[J]. ECS Journal of Solid State Science and Technology, 6(10): 723-727.

4.Yan, W., Z. Zhang （Corresponding author）, et al. (2015). The Effect of pH on Sapphire Chemical Mechanical Polishing. ECS Journal of Solid State Science and Technology, 4(3): P108-P111.

5.Yan, W., Z. Zhang, et al. (2015). Effect of Abrasive Concentration on Chemical Mechanical Polishing of Sapphire. Chinese Physics Letters, 32(8): 088301-1-4.

6.张泽芳，侯蕾，闫未霞，刘卫丽，宋志棠, 纳米SiO2抛光液的制备及在蓝宝石抛光中的应用. 润滑与密封 2013,(7), 88-91.

7.张泽芳，刘卫丽，宋志棠(2012). 不同碱和分散剂对蓝宝石基片研磨的影响研究. 半导体技术，2012, 37 (4), 267-270.

8.Z. Zhang, W. Yan, L. Zhang, W. Liu and Z. Song Zhang, Z., et al. (2011). Effect of mechanical process parameters on friction behavior and material removal during sapphire chemical mechanical polishing. Microelectronic Engineering 88(9): 3020-3023.

9.Z. Zhang, W. Liu and Z. Song (2011). Influence of pH and Abrasive Concentration on Polishing Rate of Amorphous Ge2Sb2Te5 Film in Chemical Mechanical Polishing. Journal of Vacuum Science & Technology B 29(1): 011020.

10.Z. Zhang, L. Yu, W. Liu and Z. Song (2011). Single-crystalline CeOHCO3 with Rhombic Morphology: Synthesis and Thermal Conversion to CeO2. Chinese Journal of Inorganic Chemistry 27(4): 759-763.

11.Z. Zhang, W. Liu, Z. Song and X. Hu (2010). Two-step chemical mechanical polishing of sapphire substrate. Journal of the Electrochemical Society 157(6): H688-H691.

12.Z. Zhang, W. Liu and Z. Song (2010). Surface modification of ceria nanoparticles and their chemical mechanical polishing behavior on glass substrate. Applied Surface Science 256(12): 3856-3861.

13.Z. Zhang, W. Liu J. Zhu and Z. Song (2010). Synthesis, characterization of ceria-coated silica particles and their chemical mechanical polishing performance on glass substrate. Applied Surface Science 257(5): 1750-1755.

14.Z. Zhang, W. Liu and Z. Song (2010). Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate. Microelectronic Engineering 87(11): 2168-2172.

15.Z. Zhang, W. Liu and Z. Song (2010). Particle size and surfactant effects on chemical mechanical polishing of glass using silica-based slurry. Applied Optics 49(28): 5480-5485.

16.Z. Zhang, W. Liu and Z. Song (2010). Effect of Ammonium Molybdate Concentration on Chemical Mechanical Polishing of Glass Substrate. Chinese Journal of Semiconductors 31(11): 116003-4.

17.Z. Zhang and H. Lei (2008). Preparation of alpha-alumina/polymethacrylic acid composite abrasive and its CMP performance on glass substrate. Microelectronic Engineering 85(4): 714-720.

2019 山西省青年拔尖人才

2018 山西省“三晋英才”拔尖骨干人才

2014 中国科学院创新促进会会员

2011 中国科学院院长优秀奖